Ion & Electron Sources
Ion and electron sources are fundamental components in particle accelerator technology, responsible for generating the charged particles necessary for a wide range of scientific and industrial applications.
These sources vary in design and function, from simple filament-based devices to advanced electron cyclotron resonance (ECR) ion sources. The stability and control of these sources generate consistent, high-quality particle beams, which are essential for applications such as microscopy, materials processing, and nuclear medicine.
Types:
Electron Cyclotron Resonance (ECR) Ion Source
ECR sources use microwave radiation and strong magnetic fields to create and confine a high-temperature plasma, enabling the production of highly charged ions through stepwise ionization. They excel in generating high charge states efficiently due to their long ion confinement times and high electron densities.
Penning Ion Source
Penning sources use crossed electric and magnetic fields to confine electrons, which ionize gas atoms through collisions. They produce both H+ and H- ions for medical radioisotope production cyclotrons, particularly PET cyclotrons. Recent research explores their cost-effective potential for generating higher charge states (2+ to 6+) for medical and semiconductor applications.
Volume Cusp Ion Source
Volume cusp sources use multiple permanent magnets arranged in a multicusp configuration to confine plasma. They are known for producing high-current, low-emittance negative ion beams. These sources are particularly effective for generating H- ions for radioisotope production.
Bernas Ion Source
Bernas-type sources, also known as hot cathode sources, use a heated cathode to emit electrons that ionize gas atoms in an arc discharge. They can produce a wide range of ion species and are are commonly used in ion implantation systems.
Surface Ion Source
Surface ion sources operate by passing atoms over a hot metal surface, causing ionization through electron transfer. They are particularly effective for elements with low ionization potentials. These sources can produce very pure ion beams and are used in various research applications.
Laser Plasma Ion Source
Laser plasma ion sources use high-power laser pulses to create a dense plasma from solid targets. This method can produce highly charged ions of virtually any element. These sources are capable of generating very short, intense ion pulses and are used in specialized research applications.
Thermionic Electron Source
Thermionic electron sources emit electrons by heating a metal cathode to high temperatures. These sources can provide continuous electron beams with moderate current densities and are often used in electron microscopes and linear accelerators.
Field Emission Electron Source
Field emission sources extract electrons from a sharp metal tip using strong electric fields. They can produce high-brightness electron beams with low energy spread. These sources are often used for electron microscopy and in free-electron lasers.
Books
Handbook of Ion Sources – B. Wolf
Handbook of Ion Implantation Technology – J. Ziegler
Physics and Applications of Hydrogen Negative Ion Sources – M. Bacal
Electron Cyclotron Resonance Ion Sources and ECR Plasmas – R. Geller
The Physics and Technology of Ion Sources – I. Brown
Articles
On-line charge breeding using ECRIS and EBIS – R. Vondrasek
Development and characterization of a Penning ion source using helium – N. Savard
Extraction of High-charge State Argon and 𝛼-particles From D-pace Penning Ion Source Test Stand – N. Savard
A 60 mA DC H− multi cusp ion source developed at TRIUM – K. Jayamanna
The production of negative carbon ions from volume-cusp ion sources – S. Melanson
The extraction of both positive and negative ions from a volume cusp H− ion source – S. Melanson
Bernas source for the Precision Implant 9200 – M. Vella
Characterization of a Bernas ion source for multiply charged ion implantation – S. Walther
Surface Ionization Ion Sources – R. Wilson
Surface ionization source for heavy ions – B. Rasser
Laser ion source for semiconductor applications – T. Kulevoy
Point field emission electron source with a magnetically focused electron beam – P. Urbanski
Design of an Rf Modulated Thermionic Electron Source At Triumf – K. Fong
Presentations
H‾, D‾ & He++ Source Developments for Medical Isotope Production Cyclotrons – D-Pace
Particle-in-cell modeling of low-temperature plasma ion sources for ion implantation – S. Veitzer
Additional Resources
CERN Ion Source Characterization
Accelerator Laboratory – University of Jyväskylä
NanoScience Instruments – Thermionic vs. Field Emission Sources: 4 Key Differences
ThermoFisher: How Do You Make an Electron Beam?
CERN Accelerator School: Definitions of Ion Sources
Ion Source Manufacturers
Plasmonique Ion Sources and Implanters
Calabasaz Creek Research, Inc.
Electron Source Manufacturers
Hitachi High-Tech Electron Sources